Novel non-thermal Ablation Mechanics in the Laser Ablation of Silicon
Dominic Klein, Simon Kümmel, Johannes Roth
TL;DR
The paper addresses how ultrafast laser irradiation induces non-thermal ablation in covalent silicon, a regime where bond weakening and transient electronic excitations alter traditional ablation pathways. It deploys an integrated framework combining the Thermal-Spike-Model with MD and an excitation-dependent MOD* potential to capture non-thermal bonding changes and carrier dynamics, enabling exploration of excitation-dependent phase behavior via thermodynamic integration. The main contributions include identifying three non-thermal ablation mechanisms (non-thermal evaporation, pre-shockwave non-thermal melting, and non-thermal void formation with spallation), demonstrating realistic-scale simulations with composed and direct approaches, and constructing preliminary electron-temperature–dependent phase diagrams that link excitation to structural instability. The work shows that MOD* yields ablation depths consistent with experiments and reveals how increasing electron temperature drives bond weakening and diamond-structure instability, providing a predictive, resource-efficient framework for covalent semiconductor laser ablation.
Abstract
We investigate the non-thermal material dynamics of strongly excited silicon during ultra-fast laser ablation. In contrast to metals, silicon shows strongly excitation-dependent interatomic bonding strengths, which gives rise to a number of unique material dynamics like non-thermal melting, Coulomb explosions and altered carrier heat conduction due to charge carrier confinement. In this study, we report novel non-thermal ablation mechanisms in the ultra-fast single shot laser ablation of silicon and perform large scale massive multi-parallel simulations on experimentally achievable length scales with atomistic resolution. For this, we model the ultra-fast carrier dynamics utilizing the Thermal-Spike-Model coupled to Molecular Dynamics simulations and include the accompanied excitation-dependent nonthermal bonding strength manipulation by application of the excitation-dependent modified Tersoff Potential. Further, we present first results on the systematic construction of the excitation-dependent phase diagram of silicon by thermodynamic integration.
