Artifact Removal and Image Restoration in AFM:A Structured Mask-Guided Directional Inpainting Approach
Juntao Zhang, Angona Biswas, Jaydeep Rade, Charchit Shukla, Juan Ren, Anwesha Sarkar, Adarsh Krishnamurthy, Aditya Balu
TL;DR
AFM images suffer from environmental noise and scanner artifacts that degrade interpretability. The authors present a lightweight, geometry-aware pipeline that automates artifact detection, artifact localization, and restoration via mask-guided directional inpainting, with a Tkinter GUI for real-time control. Key contributions include a ResNet-18-based four-class classifier, a fast segmentation module with aspect-ratio-based stripe expansion, a mask-guided Smart Flatten, and directional inpainting with Telea and localized smoothing, achieving high accuracy and robust restoration on AFM data. The approach preserves nanoscale surface features and enables high-throughput, reproducible AFM data analysis, with potential to integrate into digital twins and multi-channel AFM workflows.
Abstract
Atomic Force Microscopy (AFM) enables high-resolution surface imaging at the nanoscale, yet the output is often degraded by artifacts introduced by environmental noise, scanning imperfections, and tip-sample interactions. To address this challenge, a lightweight and fully automated framework for artifact detection and restoration in AFM image analysis is presented. The pipeline begins with a classification model that determines whether an AFM image contains artifacts. If necessary, a lightweight semantic segmentation network, custom-designed and trained on AFM data, is applied to generate precise artifact masks. These masks are adaptively expanded based on their structural orientation and then inpainted using a directional neighbor-based interpolation strategy to preserve 3D surface continuity. A localized Gaussian smoothing operation is then applied for seamless restoration. The system is integrated into a user-friendly GUI that supports real-time parameter adjustments and batch processing. Experimental results demonstrate the effective artifact removal while preserving nanoscale structural details, providing a robust, geometry-aware solution for high-fidelity AFM data interpretation.
