Thermally-Activated Epitaxy of NbO
Sandra Glotzer, Jeong Rae Kim, Joseph Falson
TL;DR
This work establishes a thermally activated epitaxy window for NbO growth at $T_G > 1000^{\circ}C$, achieving high-quality NbO films with robust transport properties across a wide $P_{O_2}$ range and reduced impurity effects. By combining MBE with CO$_2$ laser heating and detailed structural/electrical characterization, the authors map a $T_G$-$P_{O_2}$ phase diagram showing sharp Nb/NbO/NbO$_2$ boundaries and non-monotonic optimal oxygen pressures. They argue that high-temperature, diffusion-assisted growth drives reproducible NbO formation, and they propose prototypical NbO properties, including a Hall coefficient $R_H$ that changes sign with temperature and a superconducting transition temperature $T_c$ around 1.32–1.37 K, illuminating the electronic structure and potential applications of NbO in oxide electronics. The findings highlight the importance of thermal activation for the synthesis of refractory metal oxides and establish NbO as a model system for thermally activated epitaxy and defect-controlled transport.
Abstract
We demonstrate a thermally-activated epitaxy window for the growth of NbO at temperatures exceeding 1000 $^o$C. NbO films grown in this mode display superior structural and transport properties, which are reproducible across a window of oxygen partial pressure. Through comprehensive analysis, we propose the prototypical electrical properties of NbO, for which a consensus has not yet been made. This study unequivocally demonstrates the utility of high temperatures in the thin film synthesis of refractory metal compounds.
