Epitaxial thin film growth in the U-Ge binary system
Syed Akbar Hussain, Ali A. M. H. Jasem, Lottie M. Harding, Ross S. Springell, Christopher Bell
TL;DR
This work demonstrates epitaxial growth of U-Ge thin films on MgO, CaF$_2$, and SrTiO$_3$, revealing a tendency toward mixed phases dominated by UGe$_3$ and UGe, with occasional UGe$_2$ and oxide formation (notably UO$_2$) at elevated temperatures due to oxygen gettering from substrates. By varying growth temperature and Ge content through co-deposition, the authors map substrate- and condition-dependent phase formation, observing texture changes and high crystallinity for certain UGe$_3$-rich films, particularly on MgO. A resistivity study indicates metallic behavior and relatively high residual resistivity ratios (up to ~6.1 for MgO), with signatures around 74 K pointing to spin fluctuations in U-Ge richer films. The study highlights the challenge of achieving phase-pure UGe$_2" and proposes buffer-layer strategies to mitigate oxygen uptake, setting a path toward controlled epitaxial U-Ge thin films for exploring heavy-fermion physics and potential superconductivity.
Abstract
We explore the U-Ge phase diagram using thin film growth by co-deposition of U and Ge via d.c. magnetron sputtering. Using three different single crystal substrates - MgO, CaF$_2$ and SrTiO$_3$ - we have stabilised mixed phase films of mostly UGe$_3$ and UGe, with evidence of UGe$_2$ as well. At higher temperatures UO$_2$ forms as a consequence of gettering of oxygen from several types of substrate. Several UGe$_3$ dominated samples grown on MgO substrates have also been characterised electrically, showing residual resistivity ratios up to six.
