Multiport Analytical Pixel Electromagnetic Simulator (MAPES) for AI-assisted RFIC and Microwave Circuit Design
Junhui Rao, Yi Liu, Jichen Zhang, Zhaoyang Ming, Tianrui Qiao, Yujie Zhang, Chi Yuk Chiu, Hua Wang, Ross Murch
TL;DR
MAPES delivers a physics-based, analytical multiport framework for fast EM prediction of arbitrary pixel-based MW/RFIC structures by converting the design into a virtual-pixel network with diagonal virtual pixels and a single impedance matrix. A small set of full-wave simulations builds the prior matrix $oldsymbol{Z}_{ALL}$, after which any pixel pattern is evaluated via a closed-form formula to yield S-parameters, enabling 600–2000× speedups with high fidelity across CMOS and PCB cases. This approach avoids data-driven overfitting inherent to AI surrogates, scales to multi-layer and via-containing designs, and offers practical use as a fast dataset generator and physics-informed backbone for inverse design and RL-based layout optimization. Comparisons with CST show excellent agreement, while the method provides substantial reductions in data and computation, making it attractive for AI-assisted RFIC/microwave circuit design.
Abstract
This paper proposes a novel analytical framework, termed the Multiport Analytical Pixel Electromagnetic Simulator (MAPES). MAPES enables efficient and accurate prediction of the electromagnetic (EM) performance of arbitrary pixel-based microwave (MW) and RFIC structures. Inspired by the Integrated Internal Multiport Method (IMPM), MAPES extends the concept to the pixel presence/absence domain used in AI-assisted EM design. By introducing virtual pixels and diagonal virtual pixels and inserting virtual ports at critical positions, MAPES captures all horizontal, vertical, and diagonal electromagnetic couplings within a single multiport impedance matrix. Only a small set of full-wave simulations (typically about 1% of the datasets required by AI-assisted EM simulators) is needed to construct this matrix. Subsequently, any arbitrary pixel configuration can be evaluated analytically using a closed-form multiport relation without additional full-wave calculations. The proposed approach eliminates data-driven overfitting and ensures accurate results across all design variations. Comprehensive examples for single- and double-layer CMOS processes (180 nm and 65 nm) and PCBs confirm that MAPES achieves high prediction accuracy with 600- 2000x speed improvement compared to CST simulations. Owing to its efficiency, scalability and reliability, MAPES provides a practical and versatile tool for AI-assisted MW circuit and RFIC design across diverse fabrication technologies.
