Secondary electron topographical contrast formation in scanning transmission electron microscopy
Evgenii Vlasov, Wouter Heyvaert, Tom Stoops, Sandra Van Aert, Johan Verbeeck, Sara Bals
TL;DR
This work addresses the challenge of interpreting secondary-electron topographic contrast in STEM by introducing a forward analytical model that integrates SE emission physics with the magnetic-field interaction in the objective lens. The key contribution is a closed-form expression for SE yield that depends on local thickness $t$ and surface inclination $\alpha$, enabling realistic SE-STEM image simulations from 3D data and electron tomography reconstructions. The results show qualitative agreement with experimental SEEBIC images and highlight the model’s utility for understanding topographic contrast and guiding potential 3D surface reconstruction, while detailing limitations (e.g., magnetic mirror effects, support SE re-absorption) and future improvements (ray tracing). The approach provides a principled framework for more reliable SE-STEM interpretation and could underpin rapid 3D morphology analyses in nanomaterials research.
Abstract
Secondary electron (SE) imaging offers a powerful complementary capabilities to conventional scanning transmission electron microscopy (STEM) by providing surface-sensitive, pseudo-3D topographic information. However, contrast interpretation of such images remains empirical due to complex interactions of emitted SE with the magnetic field in the objective field of TEM. Here, we propose an analytical physical model that takes into account the physics of SE emission and interaction of the emitted SEs with magnetic field. This enables more reliable image interpretation and potentially lay the foundation for novel 3D surface reconstruction algorithms.
