A Normalized Descriptor for Unbiased Screening of Second-Order Nonlinear Optical Materials
Aubrey G. J. Nyiri, Michael J. Waters, James M. Rondinelli
TL;DR
This work addresses the challenge of fairly comparing SHG performance across materials with different band gaps by validating a band-gap–dependent upper bound on $|χ^{(2)}|$ and introducing a normalized descriptor $\hat{d} = \frac{2}{ξ} d_{ij}^{\mathrm{max}} E_g^4$ (with $ξ = 17370~\mathrm{pm\,V^{-1}\,eV^{4}}$). It demonstrates that $|χ^{(2)}|$ scales roughly as $E_g^{-4}$ and that $\hat{d}$ remains approximately uniform across a wide range of $E_g$, enabling unbiased cross-material screening and interpretable machine-learning labels. The descriptor shows strong transferability across DFT functionals (LDA, PBE vs HSE) and correlates with conventional SHG metrics, supporting its use for rapid, band-gap–aware material discovery from large ab initio NLO databases. Limitations arise at low band gaps due to dataset biases, but within application-relevant windows, $\hat{d}$ provides a practical, physics-informed filter to accelerate the identification of high-performance NLO materials from mid-IR to deep-UV ranges.
Abstract
Second-order nonlinear optical materials enable frequency doubling of light (second-harmonic generation, SHG), which is essential for optoelectronic applications ranging from materials characterization to quantum technologies. However, comparing SHG performance across materials remains challenging as the second-order nonlinear susceptibility $χ^{(2)}$ spans several orders of magnitude and strongly depends on the band gap $E_g$. To address this, we empirically validate a theoretical upper bound on $χ^{(2)}$ using new databases of \textit{ab initio}-computed nonlinear optical (NLO) properties. We then formulate a normalized descriptor, $\hat{d}$, which expresses the NLO response of a material relative to the band gap-dependent physical limit. We show that $\hat{d}$ exhibits a similar distribution across a wide range of band gap energies. This universality supports the use of $\hat{d}$ as a robust, generalizable descriptor for data-driven and chemistry-informed machine learning models of NLO response, enabling accelerated materials discovery and optimization across broad application frequencies.
