Tuning Superconductivity in Sputtered W0.75Re0.25 Thin Films
F. Colangelo, F. Avitabile, Z. Makhdoumi Kakhaki, A. Kumar, A. Di Bernardo, C. Bernini, A. Martinelli, A. Nigro, C. Cirillo, C. Attanasio
TL;DR
This study demonstrates that nitrogen incorporation during UHV DC sputtering of $W_{0.75}Re_{0.25}$ thick films tunes crystal phase, driving a transition from mixed $oldsymbol{ extalpha}$-WRe/$oldsymbol{eta}$-WRe toward a predominantly amorphous or $oldsymbol{eta}$-WRe structure and substantially altering transport. The authors correlate structural disorder with higher $T_c$ in nitrogen-rich films and reveal a thickness- and disorder-dependent evolution of the upper critical field, including a 2D–3D crossover governed by an effective thickness $d_{eff}$. Fluctuation analyses above $T_c$ show 2D AL+MT behavior consistent with a disordered thin-film regime, supporting a picture of an amorphous interfacial layer influencing superconductivity. Overall, the work highlights a link between crystallinity, amorphous layering, and superconducting properties in W-based thin films, with potential relevance for SNSPD technologies and disorder-tin films.
Abstract
W0.75Re0.25, in its bulk form, has been shown to be an interesting superconducting material due to its multiple crystalline phases, each exhibiting distinct superconducting characteristics. However, little is known about how these phases manifest in thin-film form, where deposition conditions and dimensionality are critical aspects. Here, we investigate superconducting W0.75Re0.25 thin films deposited via UHV dc magnetron sputtering. In order to tune the crystalline phase of the films, we further explored the effect of incorporating N2 during the deposition. The superconducting and normal-state properties as a function of deposition conditions were investigated, revealing the role of the crystal phase on the film transport properties.
