Thickness of epithelia on wavy substrates: measurements and continuous models
Nicolas Harmand, Julien Dervaux, Christophe Poulard, Sylvie Hénon
TL;DR
This study quantifies how substrate curvature affects epithelial thickness by culturing MDCK epithelia on sinusoidally corrugated substrates and measuring valley–ridge thickness differences. It tests three continuum descriptions—thin liquid film, thin elastic film, and thin elastic film with apical active stress—against the data, finding that surface tension and elasticity alone yield qualitative agreement but fail to match the measurements quantitatively. Incorporating an apical active stress substantially improves agreement, with fitted parameters suggesting differing apical contractility between WT and E-cadherin–GFP–expressing epithelia. The work links cellular-level active stresses to tissue-scale curvature responses, providing a framework to study curvature-driven morphogenesis in epithelia.
Abstract
We measured the thickness of MDCK epithelia grown on substrates with a sinusoidal profile. We show that while at long wavelength the profile of the epithelium follows that of the substrate, at short wavelengths cells are thicker in valleys than on ridges. This is reminiscent of the so-called « healing length » in the case of a thin liquid film wetting a rough solid substrate. We explore the ability of continuum mechanics models to account for these observations. Modeling the epithelium as a thin liquid film, with surface tension, does not fully account for the measurements. Neither does modeling the epithelium as a thin incompressible elastic film. On the contrary, the addition of an apical active stress gives satisfactory agreement with measurements, with one fitting parameter, the ratio between the active stress and the elastic modulus.
