Calculations of pathways of precise P incorporation into chlorinated Si(100) surface
T. V. Pavlova
TL;DR
The study addresses how to achieve atomically precise phosphorus incorporation into Si(100) by biasing the P–Si exchange toward a single neighboring Si atom. It employs spin-polarized density functional theory with NEB on Si(100)-2x1-Cl slabs containing three Cl vacancies to map adsorption sites and exchange pathways. The results show that an asymmetric Cl-vacancy arrangement favors a dominant P–Si exchange pathway with a barrier of $E_a=1.16$ eV (and a diffusion barrier of $E_a\approx1.21$ eV), enabling controlled incorporation; a detailed STM-based protocol involving Cl bivacancies and PBr3 adsorption is proposed to realize this site-selective exchange, with annealing completing the substitution. This approach offers a route to deterministic single-impurity devices, contingent on experimental precision in halogen manipulation and subsequent epitaxial silicon growth to preserve P positions.
Abstract
The precise incorporation of a phosphorus atom into a silicon surface is essential for the fabrication of nanoelectronic devices in which the active area is formed from single impurities. The most accurate approach employs scanning tunneling microscopy (STM) lithography, which may be done with atomic precision. However, the accuracy decreases when phosphorus is incorporated into the surface because P substitutes one of two neighboring Si atoms with equal probability. Here, the P-Si exchange mechanism was studied theoretically on a chlorinated Si(100) surface with an asymmetric configuration of Cl vacancies surrounding the P atom. Density functional theory was used to estimate the activation barriers and exchange rates between a P atom and neighboring Si atoms on a Si(100)-2$\times$1-Cl surface with three Cl vacancies. The calculation of various P-Si exchange pathways revealed that phosphorus has a higher probability of substituting one Si atom than the others due to the asymmetric configuration of Cl vacancies. Based on the theoretical study of the P-Si exchange mechanism and experimental results from previous works, a scheme for controlled P incorporation into the silicon surface without uncertainty is proposed.
