Unveiling the growth mode diagram of GaSe on sapphire
M. Bissolo, M. Dembecki, J. Belz, J. Schabesberger, M. Bergmann, P. Avdienko, F. Rauscher, A. S. Ulhe, H. Riedl, K. Volz, J. J. Finley, E. Zallo, G. Koblmüller
TL;DR
This study establishes a wafer-scale growth-mode phase diagram for GaSe on c-plane sapphire by molecular beam epitaxy, integrating in-situ RHEED, Raman spectroscopy, SEM, AFM, EDX, and HR-XRD to connect substrate temperature and Se/Ga flux ratio with crystal phase and surface morphology. The authors identify distinct growth regimes, including Ga droplets, 3D-nanoflakes, 2D GaSe, and Ga2Se3, and reveal a high-temperature 2D GaSe window with partial epitaxy limited by an amorphous interfacial layer that decouples the film from the substrate. In-situ diagnostics enable real-time tracking of transitions between growth modes, with logistic and Arrhenius-like analyses quantifying onset temperatures and activation energies for regime boundaries. The work demonstrates a RHEED-based pathway to synthesize GaSe with controlled phase and morphology and provides a general framework for optimizing growth of other 2D PTMCs on industry-relevant substrates, advancing scalable fabrication of GaSe-based optoelectronics.
Abstract
The growth of two-dimensional epitaxial materials on industrially relevant substrates is critical for enabling their scalable synthesis and integration into next-generation technologies. Here we present a comprehensive study of the molecular beam epitaxial growth of gallium selenide on 2-inch c-plane sapphire substrates. Using in-situ reflection high-energy electron diffraction (RHEED), in-situ Raman spectroscopy, optical and scanning electron microscopies, we construct a diagram of the gallium selenide growth modes as a function of substrate temperature (530-650 °C) and Se/Ga flux ratio (5-110). The growth mode diagram reveals distinct regimes, including the growth of layered post-transition metal monochalcogenide GaSe with an unstrained in-plane lattice constant of 0.371$\pm$0.001 nm and a partial epitaxial alignment on sapphire. This work demonstrates a RHEED-based pathway for synthesizing gallium selenide of specific phase and morphology, and the construction of a phase diagram for high vapor pressure III-VI compounds that can be applied to a wide range of other metal chalcogenide materials.
