Injector for dielectric laser accelerators based on an ultracold electron source and a magnet design avoiding apparent emittance growth
Ameya Patwardhan, Simona Borrelli, Bas van der Geer, Jom Luiten, Julius Huijts
TL;DR
The paper addresses the bottleneck of low injected charge in sub-relativistic dielectric laser accelerators by proposing an injector based on a ultracold electron source and a novel permanent-magnet focusing system that creates zero axial field at the source and the focus to suppress emittance growth. A multi-objective optimization framework guides the magnet design, yielding Pareto fronts that balance focal size and injected charge, with a two-magnet assembly chosen for practicality. Particle-tracking simulations show that a 0.5 fC bunch at 16.6 keV can be tightly focused into a DLA structure, yielding a final focal spot on the order of a micron and a modest energy spread, corresponding to about 3% injection efficiency into a 1 GV/m dielectric gradient (roughly 90 electrons per bunch). The approach provides a significant increase in injected charge over prior injectors and offers a general design methodology applicable to other sub-relativistic, high-brightness beam applications such as ultrafast electron diffraction and compact accelerators.
Abstract
Dielectric Laser Acceleration holds the promise of extremely high acceleration gradients in laser-driven miniaturized accelerator structures. However, sub-relativistic experimental demonstration has so far been limited by bunch charges well below 1 electron per bunch due to the low acceptance of these 'accelerator-on-a-chip' devices. Here, we propose a novel design for an injector tailor made for dielectric laser acceleration, based on just-above-threshold ionization of laser-cooled atoms. The key new feature is a an innovative magnet design that avoids apparent emittance growth by using the field-free regions of an axially polarised ring of permanent magnets as source point. We optimized this design using a multi-objective optimization approach that is also applicable to the development of other sub-relativistic, high-brightness/low-emittance electron beam setups (like setups for ultrafast electron diffraction). The expected injected bunch charge of our proposed injector is 90 (60) electrons for a dielectric laser acceleration gradient of 1 GV/m (100MV/m) operating at a 10 micron driver laser wavelength, increasing the expected bunch charge by about two orders of magnitude.
