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SparseC-AFM: a deep learning method for fast and accurate characterization of MoS$_2$ with C-AFM

Levi Harris, Md Jayed Hossain, Mufan Qiu, Ruichen Zhang, Pingchuan Ma, Tianlong Chen, Jiaqi Gu, Seth Ariel Tongay, Umberto Celano

TL;DR

The paper addresses the bottleneck of slow C-AFM metrology for 2D materials like $MoS_2$ by developing SparseC-AFM, an AI-accelerated workflow that reconstructs full-resolution morphology and current maps from undersampled scans. The method uses a SwinIR-based upsampling network to achieve up to $11\times$ faster data acquisition with preserved electrical-property predictions, demonstrated across sparsity factors up to $\times64$. It outperforms prior sparse AFM approaches in reconstruction quality (PSNR/SSIM) while maintaining key metrics such as film coverage and defect density, enabling reliable material characterization. The approach is non-intrusive and generalizable, offering a practical path for industrial 2D-material metrology, with code and weights available at GitHub.

Abstract

The increasing use of two-dimensional (2D) materials in nanoelectronics demands robust metrology techniques for electrical characterization, especially for large-scale production. While atomic force microscopy (AFM) techniques like conductive AFM (C-AFM) offer high accuracy, they suffer from slow data acquisition speeds due to the raster scanning process. To address this, we introduce SparseC-AFM, a deep learning model that rapidly and accurately reconstructs conductivity maps of 2D materials like MoS$_2$ from sparse C-AFM scans. Our approach is robust across various scanning modes, substrates, and experimental conditions. We report a comparison between (a) classic flow implementation, where a high pixel density C-AFM image (e.g., 15 minutes to collect) is manually parsed to extract relevant material parameters, and (b) our SparseC-AFM method, which achieves the same operation using data that requires substantially less acquisition time (e.g., under 5 minutes). SparseC-AFM enables efficient extraction of critical material parameters in MoS$_2$, including film coverage, defect density, and identification of crystalline island boundaries, edges, and cracks. We achieve over 11x reduction in acquisition time compared to manual extraction from a full-resolution C-AFM image. Moreover, we demonstrate that our model-predicted samples exhibit remarkably similar electrical properties to full-resolution data gathered using classic-flow scanning. This work represents a significant step toward translating AI-assisted 2D material characterization from laboratory research to industrial fabrication. Code and model weights are available at github.com/UNITES-Lab/sparse-cafm.

SparseC-AFM: a deep learning method for fast and accurate characterization of MoS$_2$ with C-AFM

TL;DR

The paper addresses the bottleneck of slow C-AFM metrology for 2D materials like by developing SparseC-AFM, an AI-accelerated workflow that reconstructs full-resolution morphology and current maps from undersampled scans. The method uses a SwinIR-based upsampling network to achieve up to faster data acquisition with preserved electrical-property predictions, demonstrated across sparsity factors up to . It outperforms prior sparse AFM approaches in reconstruction quality (PSNR/SSIM) while maintaining key metrics such as film coverage and defect density, enabling reliable material characterization. The approach is non-intrusive and generalizable, offering a practical path for industrial 2D-material metrology, with code and weights available at GitHub.

Abstract

The increasing use of two-dimensional (2D) materials in nanoelectronics demands robust metrology techniques for electrical characterization, especially for large-scale production. While atomic force microscopy (AFM) techniques like conductive AFM (C-AFM) offer high accuracy, they suffer from slow data acquisition speeds due to the raster scanning process. To address this, we introduce SparseC-AFM, a deep learning model that rapidly and accurately reconstructs conductivity maps of 2D materials like MoS from sparse C-AFM scans. Our approach is robust across various scanning modes, substrates, and experimental conditions. We report a comparison between (a) classic flow implementation, where a high pixel density C-AFM image (e.g., 15 minutes to collect) is manually parsed to extract relevant material parameters, and (b) our SparseC-AFM method, which achieves the same operation using data that requires substantially less acquisition time (e.g., under 5 minutes). SparseC-AFM enables efficient extraction of critical material parameters in MoS, including film coverage, defect density, and identification of crystalline island boundaries, edges, and cracks. We achieve over 11x reduction in acquisition time compared to manual extraction from a full-resolution C-AFM image. Moreover, we demonstrate that our model-predicted samples exhibit remarkably similar electrical properties to full-resolution data gathered using classic-flow scanning. This work represents a significant step toward translating AI-assisted 2D material characterization from laboratory research to industrial fabrication. Code and model weights are available at github.com/UNITES-Lab/sparse-cafm.

Paper Structure

This paper contains 13 sections, 5 equations, 6 figures.

Figures (6)

  • Figure 1: Classic flow implementation for full-resolution mapping of MoS$_2$ with C-AFM. a) Conductive AFM tip sweeps an MoS$_2$ surface as an amplifier (A) records current response under an applied bias. b) Path traced by a conductive tip; each dot represents a sampling point on a dense grid. c) Cross-section of the junction between conductive tip and material surface. $\sim$10 nm-radius tip (grey circles) makes contact with MoS$_2$ lattice (yellow circles) with normal loading force $F$ and current path $e^{-}$. d) Full-resolution dataset produced by classic-flow implementation. (left) (256-512)$\times$(256-512)-pixel current map of monolayer MoS$_2$ visualized in RGB color-space. (Center) corresponding binary pixel map showing every probe location; (right, inset) magnified unit cell.
  • Figure 2: Our proposed workflow for rapid C-AFM scanning and characterization of 2D materials with SparseC-AFM. (Top-left) a high-level figure of our data acquisition pipeline for C-AFM. (Bottom-left) standard, full-resolution data collection and analysis procedure. (Right) our proposed, expedited workflow. A trained neural network predicts full-resolution surface morphology and current maps from undersampled inputs.
  • Figure 3: A high-level diagram of our neural-network architecture. Our model, Sparse-C-AFM, can upsample surface morphology and current maps at multiple resolutions and levels of sparsity.
  • Figure 4: Qualitative results for $\times$4 upsampling of an unseen MoS$_{2}$ sample. The top and bottom rows represent surface morphology and current channels from the C-AFM mapping, respectively. All results are visualized in RGB color-space using the matplotlib Python package set to the viridis color mapping scheme.
  • Figure 5: Are SparseCAFM-upsampled current maps true to life? We compare the electrical characteristics (e.g., mean surface current, coverage percentage, etc) of sparsely sampled MoS$_2$ to SparseCAFM predictions at varying levels of sparsity ($\times 4$, $\times 16$, $\times 64$). The scorecard figure above reports the relative, mean absolute errors of SparseCAFM predictions and sparse current maps (baseline) using ground-truth data collected using classic-flow C-AFM scanning. For example, area extended shape values of SparseCAFM-upsampled current maps are over 60% more accurate than our baseline using a total data reduction factor of $\times 64$.
  • ...and 1 more figures