SparseC-AFM: a deep learning method for fast and accurate characterization of MoS$_2$ with C-AFM
Levi Harris, Md Jayed Hossain, Mufan Qiu, Ruichen Zhang, Pingchuan Ma, Tianlong Chen, Jiaqi Gu, Seth Ariel Tongay, Umberto Celano
TL;DR
The paper addresses the bottleneck of slow C-AFM metrology for 2D materials like $MoS_2$ by developing SparseC-AFM, an AI-accelerated workflow that reconstructs full-resolution morphology and current maps from undersampled scans. The method uses a SwinIR-based upsampling network to achieve up to $11\times$ faster data acquisition with preserved electrical-property predictions, demonstrated across sparsity factors up to $\times64$. It outperforms prior sparse AFM approaches in reconstruction quality (PSNR/SSIM) while maintaining key metrics such as film coverage and defect density, enabling reliable material characterization. The approach is non-intrusive and generalizable, offering a practical path for industrial 2D-material metrology, with code and weights available at GitHub.
Abstract
The increasing use of two-dimensional (2D) materials in nanoelectronics demands robust metrology techniques for electrical characterization, especially for large-scale production. While atomic force microscopy (AFM) techniques like conductive AFM (C-AFM) offer high accuracy, they suffer from slow data acquisition speeds due to the raster scanning process. To address this, we introduce SparseC-AFM, a deep learning model that rapidly and accurately reconstructs conductivity maps of 2D materials like MoS$_2$ from sparse C-AFM scans. Our approach is robust across various scanning modes, substrates, and experimental conditions. We report a comparison between (a) classic flow implementation, where a high pixel density C-AFM image (e.g., 15 minutes to collect) is manually parsed to extract relevant material parameters, and (b) our SparseC-AFM method, which achieves the same operation using data that requires substantially less acquisition time (e.g., under 5 minutes). SparseC-AFM enables efficient extraction of critical material parameters in MoS$_2$, including film coverage, defect density, and identification of crystalline island boundaries, edges, and cracks. We achieve over 11x reduction in acquisition time compared to manual extraction from a full-resolution C-AFM image. Moreover, we demonstrate that our model-predicted samples exhibit remarkably similar electrical properties to full-resolution data gathered using classic-flow scanning. This work represents a significant step toward translating AI-assisted 2D material characterization from laboratory research to industrial fabrication. Code and model weights are available at github.com/UNITES-Lab/sparse-cafm.
