Choi-Wang inequality for affine connections
Yasuaki Fujitani
TL;DR
The paper extends the Choi-Wang lower bound for the first nonzero eigenvalue of the Laplacian on minimal hypersurfaces from manifolds with positive Ricci curvature to the Li-Xia type affine-connection setting, assuming $\mathrm{Ric}^D \ge K e^{(\alpha-\beta)u} g$. It develops a statistical manifold framework for the Li-Xia connection, establishes a Bochner-type inequality and equiaffine structure, and then uses a Reilly-type formula for the $D$-Laplacian to prove a Choi-Wang type inequality: $\lambda_1(\Delta^D_\Sigma) \ge \tfrac{K}{2}$. The work also proves a Bochner-type theorem implying Betti-number bounds in this setting and discusses limitations related to the finiteness of the fundamental group and Bishop-Gromov-type comparison, outlining future directions. By connecting affine-connection geometry with weighted curvature notions, the paper broadens spectral-geometry results to a unified framework involving substatic and 1-weighted curvature concepts.
Abstract
Choi-Wang established a lower bound for the first non-zero eigenvalue of the Laplacian on minimal hypersurfaces in manifolds with positive Ricci curvature. We extend this Choi-Wang type inequality to the setting of positive Ricci curvature with respect to the Li-Xia type affine connection.
