Exploring the Design and Measurements of Next-Generation 4H-SiC LGADs
Peter Švihra, Jan Chochol, Vladimír Kafka, Adam Klimsza, Adam Kozelsky, Jiří Kroll, Roman Malousek, Mária Marčišovská, Michal Marčišovský, Marcela Mikeštíková, Michael Moll, David Novák, Radek Novotný, Peter Slovák, Radim Špetík, Moritz Wiehe
TL;DR
This work extends LGAD technology to the wide-bandgap 4H-SiC to enable fast timing in radiation-tolerant environments by introducing an internal gain layer. The authors fabricate 3x3 mm^2 LGADs on 6-inch N-type substrates with an implanted gain region and perform comprehensive IV/CV, TCT, and beta-source tests, confirming stable high-voltage operation and appreciable charge multiplication. A key result is that one device (LGAD1_45) achieves sub-100 ps timing with a gain near 20, validating the viability of 4H-SiC LGADs for high-radiation timing detectors, while another variant (LGAD2_34) requires further optimization. The findings point to the potential of 4H-SiC LGADs for applications in high-energy physics and related fields, with future work focusing on doping optimization, device geometry, radiation resilience, and extended test-beam campaigns.
Abstract
This contribution presents the design, production, and initial testing of newly developed 4H-SiC Low Gain Avalanche Detectors (LGADs). The evaluation includes performance metrics such as the internal gain layer's efficiency in enhancing signal generation. Initial laboratory and Transient Current Technique (TCT) measurements provide insight into the device's stability and response to the signal. Due to the increase of availability provided by the industry, 4H-SiC is emerging as a strong candidate for the next-generation of semiconductor detectors. Such sensors are promising due to the inherent radiation tolerance of 4H-SiC and its stable operation across a wide temperature range. However, due to the wider-bandgap of 4H-SiC compared to standard silicon, and difficulty to produce high-quality layers thicker than 50 \textmu m, an internal charge multiplication layer needs to be introduced. The presented 4H-SiC LGADs, fabricated by onsemi, are optimized for an N-type substrate and epi wafer. The initial TCT and laboratory test results demonstrate fast charge collection and uniform multiplication across multiple samples produced on a single wafer.
