Atomic structure of the PL5 defect in silicon carbide revealed by single-spin spectroscopy and oxygen implantation
Yu Chen, Qi Zhang, Mingzhe Liu, Junda Wu, Jinpeng Liu, Xin Zhao, Jingyang Zhou, Pei Yu, Shaochun Lin, Yuanhong Teng, Wancheng Yu, Ya Wang, Changkui Duan, Fazhan Shi
TL;DR
The paper resolves the atomic structure of PL5/PL6 centers in 4H-SiC by testing competing models with single-defect imaging, ODMR spectroscopy, and ab initio calculations. It rules out the stacking-fault–driven VV-SF model and provides strong evidence that PL5 is the neutral oxygen-substituted silicon vacancy OC_V_Si in the kh configuration, aided by a dramatic yield increase under oxygen implantation. The work delivers a clear defect identity and a scalable method for high-yield generation of these centers, enabling high-sensitivity quantum sensing in two and three dimensions.
Abstract
PL5 and PL6 centers in 4H-SiC are promising for quantum applications due to their superior charge stability and optically detected magnetic resonance (ODMR) properties at room temperature. However, their atomic structures remain unresolved, with ongoing controversy regarding their potential association with stacking faults. Previous measurements relying on spin ensemble detection were insufficient to draw definitive conclusions. In this work, we conduct correlative imaging of stacking faults and PL5/PL6 at the single-defect level, definitively ruling out any spatial correlation and demonstrating that these centers are not associated with stacking faults. Furthermore, we find that substituting oxygen for nitrogen in ion implantation enhances the yields of PL5 and PL6 by more than $11$-fold and $23$-fold, respectively. Single-spin ODMR spectroscopy of PL5 reveals six distinct orientations, determines the transverse zero-field splitting parameter $E$, and characterizes the hyperfine coupling. Combined with our ab initio calculations, these results provide compelling evidence for the assignment of PL5 as an OV($kh$) defect, consisting of an oxygen atom occupying the C($k$) site as the nearest neighbor to a Si($h$) vacancy. The structural analysis together with the demonstrated defect yield enhancement lays the foundation for fabricating high-sensitivity, high-contrast ensemble quantum sensors in two and three dimensions.
