Uncovering the atomic structure of substitutional platinum dopants in MoS$_2$ with single-sideband ptychography
David Lamprecht, Anna Benzer, Manuel Längle, Mate Capin, Clemens Mangler, Toma Susi, Lado Filipovic, Jani Kotakoski
TL;DR
This work addresses atomic-scale control and verification of substitutional Pt doping in MoS2 by first creating vacancies with low-energy He irradiation and then depositing Pt to fill $V_{1S}$, $V_{2S}$, or $V_{Mo}$ sites. The authors employ single-sideband ptychography on 4D-STEM data, complemented by ab initio simulations, to achieve nearly linear phase contrast that distinguishes both vacancy types and Pt dopants with high dose efficiency, outperforming conventional HAADF imaging in resolving these configurations. They demonstrate that Pt incorporated into sulfur vacancies can occupy multiple lattice sites, with diffusion pathways and binding energies indicating room-temperature stability and a preference for the sulfur vacancy sites, while DFT and IAM simulations support the qualitative interpretation of the SSB signals. The results establish a scalable pathway for controlled substitutional doping in MoS2 and highlight the potential of SSB ptychography for atomic-scale characterization of dopant-modified 2D materials, albeit with considerations for charge redistribution effects and increased data processing requirements. These insights pave the way for targeted defect engineering in 2D catalysts and electronics, and suggest extending the approach to other dopants and 2D hosts.
Abstract
We substitute individual Pt atoms into monolayer MoS$_2$ and study the resulting atomic structures with single-sideband (SSB) ptychography supported by ab initio simulations. We demonstrate that while high-angle annular dark-field (HAADF) scanning transmission electron microscopy (STEM) imaging provides excellent Z-contrast, distinguishing some defect types such as single and double sulfur vacancies remains challenging due to their low relative contrast difference. However, SSB with its nearly linear Z-contrast and high phase sensitivity enables reliable identification of these defect configurations as well as various Pt dopant structures at significantly lower electron doses. Our findings uncover the precise atomic placement and highlight the potential of SSB ptychography for detailed structural analysis of dopant-modified 2D materials while minimizing beam-induced damage, offering new pathways for understanding and engineering atomic-scale features in 2D systems.
