Ghost projection via focal-field diffraction catastrophes
James A. Monro, Andrew M. Kingston, David M. Paganin
TL;DR
Ghost projection aims to synthesize an arbitrary target intensity $S(\mathbf{r})$ by nonnegative weights $w_k$ applied to a basis of illuminating patterns $I_k(\mathbf{r})$; this work replaces a mask-based speckle basis with a focal-field diffraction-catastrophe basis generated from phase modulations built from a truncated Zernike set and focused to produce $I_k = |\mathcal{F}[A(\rho) e^{i \phi_k}]|^2$. The authors demonstrate, via simulation, that NNLS can select a sparse subset of catastrophes to approximate $S$ (up to a pedestal $\mathcal{P}$) and show how modifying the target toward the average pattern $\langle I(\mathbf{r})\rangle$ improves reconstruction fidelity, especially under Poisson noise. They also analyze the influence of Poisson noise and discuss strategies for pedestal flattening, practical implementation across optical and matter-wave regimes, and potential applications in dynamic on-demand beam shaping, aberration correction, lithography, and tomographic manufacturing.
Abstract
Ghost projection is the reversed process of computational classical ghost imaging that allows any desired image to be synthesized using a linear combination of illuminating patterns. Typically, physical attenuating masks are used to produce these illuminating patterns. A mask-free alternative form of ghost projection is explored here, where the illuminations are a set of caustic-laden diffraction patterns known as diffraction catastrophes. These are generated by focusing a coherent beam with spatially modulated phase having random Zernike-polynomial aberrations. We demonstrate, via simulation, that a suitable linear combination of such random focal-field intensity patterns can be used as a basis to synthesize arbitrary images. In our proof-of-concept ghost-projection synthesis, the positive weighting coefficients in the decomposition are proportional to exposure times for each focal-field diffraction catastrophe. Potential applications include dynamic on-demand beam shaping of focused fields, aberration correction and lithography.
