A Machine Learning Approach Capturing Hidden Parameters in Autonomous Thin-Film Deposition
Yuanlong Zheng, Connor Blake, Layla Mravac, Fengxue Zhang, Yuxin Chen, Shuolong Yang
TL;DR
The paper tackles the difficulty of achieving a fully autonomous ML-driven thin-film deposition pipeline in physical vapor deposition (PVD) due to hidden parameters from substrates and chamber conditions. It introduces a calibration layer and Gaussian Process Regression to model optical outputs, enabling an autonomous learning and testing loop within a high-throughput, in-situ measurement setup. The approach achieves silver films with optical properties within $2.5\%$ of targets on average after $2.3$ attempts, and demonstrates superior predictive accuracy and uncertainty quantification compared to a non-calibrated baseline. This work advances autonomous material discovery by combining hardware automation, active learning, and target-driven optimization, with broad applicability to other thin-film systems.
Abstract
The integration of machine learning and robotics into thin film deposition is transforming material discovery and optimization. However, challenges remain in achieving a fully autonomous cycle of deposition, characterization, and decision-making. Additionally, the inherent sensitivity of thin film growth to hidden parameters such as substrate conditions and chamber conditions can compromise the performance of machine learning models. In this work, we demonstrate a fully autonomous physical vapor deposition system that combines in-situ optical spectroscopy, a high-throughput robotic sample handling system, and Gaussian Process Regression models. By employing a calibration layer to account for hidden parameter variations and an active learning algorithm to optimize the exploration of the parameter space, the system fabricates silver thin films with optical reflected power ratios within 2.5% of the target in an average of 2.3 attempts. This approach significantly reduces the time and labor required for thin film deposition, showcasing the potential of machine learning-driven automation in accelerating material development.
