Shear-resistant topology in quasi one-dimensional van der Waals material Bi$_4$Br$_4$
Jonathan K. Hofmann, Hoyeon Jeon, Saban M. Hus, Yuqi Zhang, Mingqian Zheng, Tobias Wichmann, An-Ping Li, Jin-Jian Zhou, Zhiwei Wang, Yugui Yao, Bert Voigtländer, F. Stefan Tautz, Felix Lüpke
TL;DR
This study uncovers a new $b/3$ in-plane shift of Bi$_4$Br$_4$ chains on the (001) surface, maintaining AB stacking and revealing a shear-strain–driven origin for the structure with a residual in-plane strain of $\gamma \approx 7.5\%$. Using low-temperature STM/STS, the authors observe a bulk insulating gap of $E_g \approx 240$ meV and metallic hinge-like edge states at monolayer steps, indicating higher-order topology consistent with a HOTI. Complementary DFT (HSE06/VASP and QE) shows that both the $b/2$ and $b/3$ configurations are quantum spin Hall insulators due to SOC-induced parity exchange at the Y point, though the $b/3$ geometry sits closer to a trivial transition with a smaller inverted gap. The results demonstrate the robustness of topological edge features under in-plane chain shifts and highlight strain engineering as a route to access or tune topological phases in quasi-1D van der Waals materials.
Abstract
Bi$_4$Br$_4$ is a prototypical quasi one-dimensional (1D) material in which covalently bonded bismuth bromide chains are arranged in parallel, side-by-side and layer-by-layer, with van der Waals (vdW) gaps in between. So far, two different structures have been reported for this compound, $α$-Bi$_4$Br$_4$ and $β$-Bi$_4$Br$_4$ , in both of which neighboring chains are shifted by $\mathbf{b}/2$, i.e., half a unit cell vector in the plane, but which differ in their vertical stacking. While the different layer arrangements are known to result in distinct electronic properties, the effect of possible in-plane shifts between the atomic chains remains an open question. Here, using scanning tunneling microscopy and spectroscopy (STM/STS), we report a new Bi$_4$Br$_4$(001) structure, with a shift of $\mathbf{b}/3$ between neighboring chains in the plane and AB layer stacking. We determine shear strain to be the origin of this new structure, which can readily result in shifts of neighboring atomic chains because of the weak inter-chain bonding. For the observed $b/3$ structure, the (residual) atomic chain shift corresponds to an in-plane shear strain of $γ\approx7.5\%$. STS reveals a bulk insulating gap and metallic edge states at surface steps, indicating that the new structure is also a higher-order topological insulator, just like $α$-Bi$_4$Br$_4$, in agreement with density functional theory (DFT) calculations.
