Electrical Interconnects for Silicon Spin Qubits
Christopher David White, Anthony Sigillito, Michael J. Gullans
TL;DR
The work investigates long-range spin interconnects for silicon spin qubits by proposing a resistive topgate that forms a one-dimensional channel between quantum dots. It develops a momentum-incoherent transport model and analyzes spin decoherence via spin-orbit coupling, valley physics, and nuclear spins, finding the D\'yakonov–Perel' mechanism to dominate while motional narrowing mitigates other noise sources, yielding spin-decoherence lengths that are favorable for practical distances. The authors derive Kraus operators and a fidelity expression for transport, establishing $L_1$ (relaxation length) and $L_2$ (decoherence length) and showing that entanglement fidelity decays primarily with length through $L_2$, with $L_1$ playing a secondary role. They conclude that resistive interconnects could enable high-fidelity, long-range gates (tens to hundreds of micrometers) in silicon spin-qubit architectures, informing experimental tests and future device designs.
Abstract
Scalable spin qubit devices will likely require long-range qubit interconnects. We propose to create such an interconnect with a resistive topgate. The topgate is positively biased, to form a channel between the two dots; an end-to-end voltage difference across the nanowire results in an electric field that propels the electron from source dot to target dot. The electron is momentum-incoherent, but not necessarily spin-incoherent; we evaluate threats to spin coherence due to spin-orbit coupling, valley physics, and nuclear spin impurities. We find that spin-orbit coupling is the dominant threat, but momentum-space motional narrowing due to frequent scattering partially protects the electron, resulting in characteristic decoherence lengths ~15 mm for plausible parameters.
