Development of a Nb-based semiconductor-superconductor hybrid platform
Sjoerd Telkamp, Tommaso Antonelli, Clemens Todt, Manuel Hinderling, Marco Coraiola, Daniel Haxell, Sofieke C. ten Kate, Deividas Sabonis, Peng Zeng, Rüdiger Schott, Erik Cheah, Christian Reichl, Fabrizio Nichele, Filip Krizek, Werner Wegscheider
TL;DR
This work tackles the difficulty of forming transparent Nb-based semiconductor–superconductor interfaces by inserting a thin in-situ Al interlayer between InAs 2DEG and Nb/NbTi films, enabling metal-to-metal epitaxy and a highly transparent interface. The optimized stack achieves an induced superconducting gap of about $1 ext{ meV}$ in NbTi-based devices, substantially larger than typical Al-based hybrids, and supports operation at high magnetic fields and temperatures (Tc up to several kelvin and Bc2 in the tesla range). MAR spectroscopy on Josephson junctions validates high interface transparency and a pronounced induced gap, with gating enabling supercurrent control and Fraunhofer-like patterns under perpendicular fields. The approach demonstrates generality across Nb and NbTi, suggesting pathways to even larger-gap materials (e.g., NbTiN) for robust hybrid quantum devices with broad operating windows.
Abstract
Semiconductor-superconductor hybrid materials are used as a platform to realise Andreev bound states, which hold great promise for quantum applications. These states require transparent interfaces between the semiconductor and superconductor, which are typically realised by in-situ deposition of an Al superconducting layer. Here we present a hybrid material based on an InAs two-dimensional electron gas (2DEG) combined with in-situ deposited Nb and NbTi superconductors, which offer a larger operating range in temperature and magnetic field due to their larger superconducting gap. We overcome the inherent difficulty associated with the formation of an amorphous interface between III-V semiconductors and Nb-based superconductors by introducing a 7 nm Al interlayer. The Al interlayer provides an epitaxial connection between an in-situ magnetron sputtered Nb or NbTi thin film and a shallow InAs 2DEG. This metal-to-metal epitaxy is achieved by optimization of the material stack and results in an induced superconducting gap of approximately 1 meV, determined from transport measurements of superconductor-semiconductor Josephson junctions. This induced gap is approximately five times larger than the values reported for Al-based hybrid materials and indicates the formation of highly-transparent interfaces that are required in high-quality hybrid material platforms.
