Second-order topological insulator in Bilayer borophene
Licheng Wang, Ali Hamza Qureshi, Yi Sun, Xiaokang Xu, Xiaojing Yao, Xinli Zhao, Ai-Lei He, Yuan Zhou, Xiuyun Zhang
TL;DR
The study tackles the challenge of realizing 2D higher-order topological insulators in realistic materials by identifying bilayer α5-borophene as a C2-protected 2D SOTI. Through first-principles calculations and tight-binding modeling, interlayer B–B covalent bonds stabilize the bilayer and open sizable direct bulk gaps, while the bulk quadrupole momentum and robust corner states reveal the second-order topology. This work provides a realistic SOTI candidate in borophene and offers a tunable platform to explore 2D higher-order topology via interlayer spacing and edge geometry. The findings highlight potential routes for borophene-based topological devices and deepen the understanding of how interlayer bonding influences topology in 2D materials.
Abstract
As the novel topological states, the higher-order topological insulators have attracted great attentions in the past years. However, their realizations in realistic materials, in particular in two dimensional systems, remains the big challenge due to the lack of adequate candidates. Here, based on the first-principle calculation and tight-binding model simulations, we identify the currently \emph{existing} bilayer $α_{5}$-phase borophenes as the two-dimensional second-order topological insulators, protected by the $C_{2}$-rotational symmetry. The formation of interlayer B-B covalent bonds, stabilizing the bilayer borophenes and opening the large direct bulk gaps ($\sim 0.55-0.62$ eV) at Fermi level, plays the key roles. The second-order topology is characterized by the bulk quantized quadrupole momentum. Our results enriches the candidates for the second-order topological insulators, and also provide a way to study topological states in borophenes.
