CustomSketching: Sketch Concept Extraction for Sketch-based Image Synthesis and Editing
Chufeng Xiao, Hongbo Fu
TL;DR
The paper tackles the limitation of text-only personalization in sketch-based image synthesis by introducing sketch concept extraction. It proposes CustomSketching, a two-stage framework that learns a new textual token $[v]$ and dual sketch encoders for contour ($S_C$) and detail ($S_D$) to enable fine-grained, sketch-guided editing within a pre-trained diffusion model. Key contributions include the novel task, a dual-sketch calmative representation with a masked encoder, and a loss design combining $\mathcal{L}_{rec}$, $\mathcal{L}_{shape}$, and $\mathcal{L}_{reg}$, validated on a new dataset with a user study and multiple applications (local editing, concept transfer, multi-concept generation, style variation). The approach improves identity preservation and reconstruction quality over adapted baselines while providing enhanced editability and controllability, enabling plug-and-play multi-concept generation. Limitations include the low-resolution latent space and per-concept training time, suggesting future work on higher resolution, faster personalization, and broader applicability.
Abstract
Personalization techniques for large text-to-image (T2I) models allow users to incorporate new concepts from reference images. However, existing methods primarily rely on textual descriptions, leading to limited control over customized images and failing to support fine-grained and local editing (e.g., shape, pose, and details). In this paper, we identify sketches as an intuitive and versatile representation that can facilitate such control, e.g., contour lines capturing shape information and flow lines representing texture. This motivates us to explore a novel task of sketch concept extraction: given one or more sketch-image pairs, we aim to extract a special sketch concept that bridges the correspondence between the images and sketches, thus enabling sketch-based image synthesis and editing at a fine-grained level. To accomplish this, we introduce CustomSketching, a two-stage framework for extracting novel sketch concepts. Considering that an object can often be depicted by a contour for general shapes and additional strokes for internal details, we introduce a dual-sketch representation to reduce the inherent ambiguity in sketch depiction. We employ a shape loss and a regularization loss to balance fidelity and editability during optimization. Through extensive experiments, a user study, and several applications, we show our method is effective and superior to the adapted baselines.
