Thermal stability of nano-scale ferroelectric domains by molecular dynamics modeling
Arne J. Klomp, Ruben Khachaturyan, Theophilus Wallis, Anna Grünebohm, Karsten Albe
TL;DR
The paper investigates how thermal fluctuations limit the stability of ultra-dense ferroelectric domain walls in BaTiO$_3$ by combining atomistic core-shell MD and a coarse-grained effective Hamiltonian MD. It demonstrates that domain-wall fluctuations can roughen walls and nucleate bridging segments, causing spontaneous collapse of nano-sized reversed domains well below the Curie temperature, thereby setting a lower bound on domain spacing and maximum wall density. The authors develop and compare methods to quantify domain-wall width $d_{ ext{DW}}$ and energy $\Delta E^*_{ ext{DW}}$, reveal temperature-dependent trends in $P_z$ and wall energy, and construct an energy-landscape picture of domain switching that emphasizes the role of charged interfaces and wall-area changes. The findings have implications for nanoelectronic devices relying on dense domain-wall networks and suggest strategies such as pinning to stabilize high-density walls, with broader relevance to ferroelectric perovskites beyond BaTiO$_3$.
Abstract
Ultra-dense domain walls are increasingly important for many devices but their microscopic properties are so far not fully understood. Here we use molecular dynamic simulations to study the domain wall stability in the prototypical ferroelectric BaTiO3 combining core-shell pair potentials and a coarse-grained effective Hamiltonian. We transfer the discussion of the field-driven nucleation and motion of domain walls to thermally induced modifications of the wall without an external driving force. Our simulations show that domain wall dynamics and stability depend crucially on microscopic thermal fluctuations. Enhanced fluctuations at domain walls may result in the formation of critical nuclei for the permanent shift of the domain wall. If two domain walls are close - put in other words, when domains are small - thermal fluctuations can be sufficient to bring domain walls into contact and lead to the annihilation of small domains. This is even true well below the Curie temperature and when domain walls are initially as far apart as 6 unit cells. Such small domains are, thus, not stable and limit the maximum achievable domain wall density in nanoelectronic devices.
